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3D IC Stacking Technology

List Price: $173.00
SKU:
9780071741958
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  • Product Details

    Author:
    Ajay Kumar, Sesh Ramaswami, Banqiu Wu
    Format:
    Hardcover
    Pages:
    544
    Publisher:
    McGraw Hill LLC (July 28, 2011)
    Imprint:
    McGraw Hill
    Audience:
    General/trade
    ISBN-13:
    9780071741958
    ISBN-10:
    007174195X
    Weight:
    27.52oz
    Dimensions:
    6.3" x 9.3" x 0.91"
    File:
    McGrawHill-MH_ONIX_V30_US_onix30_all(26_07_28)-20260919-a.xml
    Folder:
    McGrawHill
    List Price:
    $173.00
    Pub Discount:
    33.4
    Case Pack:
    22
    As low as:
    $164.35
    Publisher Identifier:
    P-MCGRAW
    Discount Code:
    H
  • Overview

    Publisher's Note: Products purchased from Third Party sellers are not guaranteed by the publisher for quality, authenticity, or access to any online entitlements included with the product.


    The latest advances in three-dimensional integrated circuit stacking technology

    With a focus on industrial applications, 3D IC Stacking Technology offers comprehensive coverage of design, test, and fabrication processing methods for three-dimensional device integration. Each chapter in this authoritative guide is written by industry experts and details a separate fabrication step. Future industry applications and cutting-edge design potential are also discussed. This is an essential resource for semiconductor engineers and portable device designers.

    3D IC Stacking Technology covers:

    • High density through silicon stacking (TSS) technology
    • Practical design ecosystem for heterogeneous 3D IC products
    • Design automation and TCAD tool solutions for through silicon via (TSV)-based 3D IC stack
    • Process integration for TSV manufacturing
    • High-aspect-ratio silicon etch for TSV
    • Dielectric deposition for TSV
    • Barrier and seed deposition
    • Copper electrodeposition for TSV
    • Chemical mechanical polishing for TSV applications
    • Temporary and permanent bonding
    • Assembly and test aspects of TSV technology